Semiconductor Filtration & Purification Products

Increasing semiconductor process challenges rely on water, chemicals, solvents, and gases which are free of yield killing submicron or nanometer size particles, as well as metal, ionic, and organic contaminants which can be leached from wetted materials. Filtration of these fluids is a critical requirement in semiconductor and other microelectronics processes. Filters and purification devices must remove the particles from upstream particle sources while not contributing other unwanted contaminants. We offer an extensive line of filtration products through our partner, Cobetter Filtration.

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CMP Filtration (Chemical Mechanical Planarization)

Without CMP (chemical mechanical planarization), advanced multi interconnect level semiconductor devices would not be possible. CMP slurries work chemically and mechanically on special tools (polishers) to smooth wafer surfaces. Well designed filters remove unwanted large hard particles and agglomerates in CMP slurries that can land on and scratch the wafer surface, while allowing engineered working particles in the slurry to pass through the filter.

Product SeriesMembraneMain Construction MaterialAvailable Configuration
PPPESPTFEPENylon66OtherPFAPPHDPEPVDF316LSSCapsuleCartridge Mini CartridgeHousing
Pleavalid →
Keevalid →
Keevalid II→
Dualvalid →

View Key Features & Benefits by Series | CMP

Electronic Chemicals & Materials

Microelectronics, and especially semiconductor end users rely on highly specialized, very pure, chemicals, gases, and materials for device fabrication. Electronic chemicals must be delivered to device manufacturers with very few, very small particles. Filters are used to remove particles in a multi-step filtration process beginning with pre-filtration of raw materials and ending with final filter at the packaging step which allows these manufacturers to meet their customer’s strict particle specifications.

Product SeriesMembraneMain Construction MaterialAvailable Configuration
PPPESPTFEPENylon66OtherPFAPPHDPEPVDF316LSSCapsuleCartridge Mini CartridgeHousing
Novacon →
Novacise →
Chemphobic→

ChemRapid→
ChemVast→
Chemega →
EPPX →
Prifend →
Prifend HF →
ArrayForce (Degasser)
Chemdeion
IonGard Aqua→
IonGard DL →
IonGard SL→
Photopex Nylon →
Photopex UPE →
Fluorolink Housing →
HCP Housing →

View Key Features & Benefits by Series | Electronic Chemicals & Materials Filters

Photolithography

As semiconductor line widths shrink, photolithography technical boundaries are challenged and new photoresists and photochemicals with more stringent contaminant specifications are required. Special filters and purifiers for resists, UPW, certain organic solvents, remove hard and soft particles as well as certain ionic contaminants which can lead to increased defects during the resist coating process.

Product SeriesMembraneMain Construction MaterialAvailable Configuration
PPPESPTFEPENylon66OtherPFAPPHDPEPVDF316LSSCapsuleCartridge Mini CartridgeHousing
IonGard SL →
IonGard DL →
Photopex Nylon →
Photopex UPE →
Photogile POU →
Photogile POU Dummy Flush →
Photogile PXOTT →
Photogile OTTII→
Nylonpolar →

View Key Features & Benefits by Series | Photolithography

Thin Film – ECD Copper Plating

Copper in back-end metalization processing is deposited via a highly controlled electrochemical deposition (plating) process. Filters play an important roll in removing particles from the electrolyte (copper sulfate) to make sure the deposited copper is mostly particle free. Higher surface energy filters, some hydrophilic, provide efficient particle removal.

Product SeriesMembraneMain Construction MaterialAvailable Configuration
PPPESPTFEPENylon66OtherPFAPPHDPEPVDF316LSSCapsuleCartridge Mini CartridgeHousing
Novacon →
ChemVast→
Photopex UPE →
Fluorolink Housings

View Key Features & Benefits by Series | Thin Film - ECD Copper Plating

Water

Water is used extensively thoughout semiconductor and manufacturing of other microelectronics industries. Ultrapure water is used to rinse process chemistry from wafers in clean applications and is also used to mix with ultrapure more concentrated process chemicals to dilute those for specific proceses. Filters are needed to protect RO membranes from particles, capture fines from ion exhange resin beds, and provide final particle removal in wafer rinse applications.

Product SeriesMembraneMain Construction MaterialAvailable Configuration
PPPESPTFEPENylon66OtherPFAPPHDPEPVDF316LSSCapsuleCartridge Mini CartridgeHousing
Prifend →
Prifend HF →
Apesfend →
EPPX →
ArrayForce (Degasser) →

View Key Features & Benefits by Series | Water

Gas

Inert and specialty gases are used in semiconductor processing to deposit metal, provide a source of ions to dope silicon, dry wafers, and remove remaining photoresist. These and other processes require particle-free gas supplies to maintain process and yield consistency. In-line gas filters remove unwanted particles to protect sensitive components and critical ‘dry’ process steps through the manufacturing cycle.

Product SeriesMembraneMain Construction MaterialAvailable Configuration
PPPFAPTFEPENylon66OtherPFAPPHDPEPVDF316LSSCapsuleCartridge Mini CartridgeHousing
Gasfender M-Type →
Gasfender N-Type PP →
Gasfender N-Type PFA →
Gasfender W-Type →

View Key Features & Benefits by Series | Gas

Wet Etch & Clean

Wafer cleaning processes remove defect causing particles as well as organic and metal ion contamination. Photoresists are stripped with aggressive, high temperature acid based chemistries or strong organic solvent blends that soften those resists. Special acid mixtures are used to control dielectric thickness to exact specifications. These very different processes require special care in choosing the right filters for good chemical and temperature compatibility, flow, and the ability to remove sometimes high particle loads which result from etch and resist strip processes.

Product SeriesMembraneMain Construction MaterialAvailable Configuration
PPPESPTFEPENylon66OtherPFAPPHDPEPVDF316LSSCapsuleCartridge Mini CartridgeHousing
Novacon →
Novacise →
ChemPhobic→
Chemrapid →
ChemVast→
Chemega →
EPPX →
Prifend →
Chemdeion
IonGard DL →
Photopex UPE →
Fluorolink Housing

View Key Features & Benefits by Series | Wet Etch & Clean

Chemical Distribution

Chemical and slurry delivery systems are an efficient and safe way to supply high volumes of chemicals and solvents to process equipment in the cleanroom. Cartridge filters are installed in PFA, PP, and even stainless steel housings in these systems and remove particles from drums or totes to protect chemical lines and the processes they are intended to supply.

Product SeriesMembraneMain Construction MaterialAvailable Configuration
PPPESPTFEPENylon66OtherPFAPPHDPEPVDF316LSSCapsuleCartridge Mini CartridgeHousing
Pleavalid →
Keevalid →
Dualvalid →
Novacon →
Novacise →
ChemPhobic→
Chemrapid →
ChemVast→
Chemega →
EPPX →
Prifend →
Prifend HF →
Chemdeion
IonGard SL→
IonGard Aqua Purifier
IonGard DL →
Photopex Nylon →
Photopex UPE →
Fluorolink Housing →
HCP Housings →

View Key Features & Benefits by Series | Chemical Distribution

NEED HELP?

We have a team of filtration experts that can help with all of your filtration needs. If you’re not sure what you’re looking for, fill out this request form or contact us here and one of our team members will be in touch with product recommendations.

ORDER ONLINE

We have a selection of filtration products on our e-commerce website, but there are many more options available. If you’re looking for something specific, tell us about it here.